China cuts photonic chip costs by 90% using nanoscale stamping on eight-inch wafers

A Chinese startup has claimed a breakthrough in photonic chip manufacturing by producing 8-inch optical chip wafers without relying on conventional deep ultraviolet (DUV) lithography systems.
Hangzhou-based Prinano said it successfully validated mass production of photonic chips using its nanoimprint lithography (NIL) technology, a manufacturing approach that physically stamps nanoscale patterns onto wafers instead of projecting them through optical systems.
According to the company, the process was carried out in collaboration with Shenzhen Litra Technology and used its PL-AS vacuum air-cushion nanoimprint lithography equipment. Prinano said the method “completely avoids” the need for DUV lithography tools while reducing manufacturing costs to about one-tenth of traditional solutions.
The announcement comes as Chinese chipmakers continue looking for alternative manufacturing technologies amid restrictions on access to advanced lithography systems from Dutch supplier ASML.
Seeking lithography alternatives
Photonic chips are used in applications such as optical communications, sensing systems, lidar, and data centers. Unlike conventional electronic chips, they process information using light rather than electrical signals.
Prinano said its technology supports wafer-level production of photonic chips and can be applied to optical communication and sensing devices based on gallium arsenide, indium phosphide, and silicon photonics.
The company said its PL-AS tool offers sub-10-nanometer line-width resolution along with wafer-level pressure control. However, it did not disclose production volumes, manufacturing yields, or customer shipment data.
Nanoimprint lithography has long been viewed as a potential alternative to traditional optical lithography because it can create extremely fine features without the need for expensive projection optics. The technology was pioneered in the 1990s by Princeton University professor Stephen Y. Chou.
Prinano founder Ge Haixiong studied under Chou and established the company in 2017 to develop NIL equipment, materials, and manufacturing processes.
Questions over scalability
Interest in nanoimprint lithography has increased in recent years as chipmakers seek lower-cost manufacturing methods. In 2023, Canon introduced a commercial NIL system and promoted it as an alternative to some advanced lithography tools.
Despite the promise, analysts have questioned whether the technology can match the throughput and yields required for large-scale semiconductor manufacturing.
Research firm SemiAnalysis has previously noted that while NIL equipment can be cheaper than advanced lithography tools, overall economics depend on factors such as defect rates, template production, throughput, and process integration.
Prinano’s announcement focuses specifically on photonic chips rather than advanced logic processors, a distinction that may make commercialization more achievable. Photonic devices often rely on repeating nanoscale structures such as gratings, waveguides, and ring resonators, which can be well suited to imprint-based manufacturing.
The company said the technology has moved into wafer-level production validation, but independent verification of yields, commercial deployment, and manufacturing scale has not yet been disclosed.
For China’s semiconductor industry, the development highlights ongoing efforts to explore alternative manufacturing routes as access to advanced lithography equipment remains restricted.