COXEM Targets HBM Inspection With Atmospheric-Pressure SEM Technology
COXEM, a scanning electron microscope (SEM) specialist, is transforming itself into a maker of nondestructive inspection equipment for advanced semiconductor packaging. The company has begun supplying modules for high-bandwidth memory (HBM) analysis and plans to introduce automated inspection equipment for panel-level packaging (PLP) and glass substrates.
"The ion beam polisher, which precisely polishes semiconductor cross sections, was developed into equipment in collaboration with a domestic equipment company," COXEM CEO Lee Jun-hee said in a recent interview at the company's headquarters in Daejeon. "It has already been supplied to major semiconductor manufacturers and is undergoing mass-production evaluations."
COXEM, founded in 2007, is a South Korean developer and manufacturer of SEMs. The company started by licensing technology from the Korea Research Institute of Standards and Science (KRISS). It localized compact tabletop SEMs in the early 2010s and ranked fifth globally in sales in 2022, establishing its competitiveness in the market.
Lee, who holds a doctorate in electrical and electronic engineering from the Korea Advanced Institute of Science and Technology (KAIST), joined COXEM as head of its research center in 2010 and led research and development (R&D) of the technology. Lee was recognized for his technology development capabilities and business planning skills in 2012.
Ion Beam Polisher Module for HBM, MLCC Targets Qualification Early Next Year
An ion beam polisher is preprocessing equipment used to etch and polish a sample before it is examined with an electron microscope. It is based on ion miller commercialization technology that COXEM completed in 2019. COXEM's ion gun module, which emits an argon (Ar) ion beam, is installed inside the equipment. A separate SEM is also installed to observe and analyze the sample after preprocessing. AP Systems handles assembly and sales of the complete equipment.
Semiconductor analysis laboratories have traditionally polished sample cross sections manually, mainly using blades or sandpaper. The ion beam polisher automates the process. It uses a nanometer-scale particle beam to create flat cross sections without errors. It also minimizes sample damage and contamination compared with chemical mechanical polishing (CMP), preserving the sample's fine structures.
The system is similar to focused ion beam-scanning electron microscope (FIB-SEM) systems from global competitors such as Thermo Fisher Scientific and ZEISS, but differs in processing area and speed. FIB-SEM can precisely process extremely small areas of several micrometers or less and is suited to detailed analysis of nanoscale defects.
The ion beam polisher can rapidly remove material across areas as wide as several millimeters at a rate of 1,000 micrometers per hour. It can be used to inspect structures and defects including through-silicon vias (TSVs) and microbumps in HBM, as well as internal layers of multilayer ceramic capacitors (MLCCs). It is also less expensive. COXEM's CP-SEM lineup combining an ion miller and SEM costs about one-tenth as much as competing FIB-SEM systems.
"We initially guaranteed 100 hours of durability for the ion gun module, but have increased that to several thousand hours to meet the requirements of actual semiconductor mass-production lines," Lee said. "We expect to pass customer qualification tests around the end of this year or early next year and move into mass-production supply."
Nondestructive Inspection Equipment for Large Substrates Under Development
COXEM is also preparing semiconductor inspection equipment under its Eirtron brand. The equipment is designed for nondestructive observation of large-area samples, including wafers, large panels and glass substrates, during manufacturing. It is based on atmospheric-pressure scanning electron microscope (A-SEM) technology developed by COXEM.
Conventional inspection of large substrates requires cutting cross sections and moving them to an analysis laboratory. This is because conventional SEMs used for inspection rely on sealed high-vacuum chambers, limiting sample size. SEMs inspect samples by analyzing signals reflected from an irradiated electron beam. If the beam collides with air particles and scatters, the signal weakens and the detected image becomes blurred. High-vacuum chambers are used to prevent this.
A-SEM addresses this issue while maintaining high-resolution imaging with 30-nanometer resolution. This is achieved by completely separating the electron column, including the electron gun that emits the beam, from the external environment using a graphene membrane.
Graphene has high electron transmittance, allowing the beam to pass while blocking outside air. A multi-window structure allows it to withstand pressure of one atmosphere. The graphene membrane and signal detector are positioned as close as possible to the sample, while helium gas is injected to minimize electron-beam scattering and signal loss. These are all proprietary technologies patented by COXEM.
A-SEM can observe samples in ambient air at atmospheric pressure, eliminating size restrictions. It also removes the need for complex preprocessing steps such as evacuating a vacuum chamber or cutting samples, helping reduce process time.
"A-SEM technology enables real-time observation and analysis on production lines without damaging samples, making it an innovation that could shift the paradigm of semiconductor inspection processes," Lee said. "By commercializing automated A-SEM equipment, we aim to take the lead in the semiconductor equipment market currently dominated by overseas companies such as Applied Materials and Hitachi."
A test model of COXEM's automated equipment is currently undergoing validation by a major South Korean substrate company. The company plans to expand its target customer base to outsourced semiconductor assembly and test (OSAT) companies.